Hong Kong, China – May, 2013 – Dymek Hong Kong gets FEI Helios Nanolab 600i Dual Beam System (FIB/SEM) order from a leading HDD manufacturing company for head cross-section and pole geometry imaging.
The Helios NanoLab series is the world’s most advanced Dual Beam platform for high quality imaging, analysis, and TEM sample preparation in semiconductor, data storage failure analysis, process development and process control laboratories.